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Four chamber magnetron sputtering coating machine HD-SSCK1600-ICP (AR+DLC+AF) experimental platform

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Characteristics of the HD-SSCK1600-ICP experimental platform:

Suitable for making filters such as NCVM, car mounted, camera superhard AR, IR-CUT, facial recognition, AR+DLC+AF, NCVM+DLC+AF one-time film formation.

◆ Film forming method: Ionization coating after magnetron sputtering ICP, with high plating rate and dense film formation

Composed of CM1 film inlet chamber (pre-treatment chamber), CM2 process chamber (optical film forming chamber), CM3 process chamber (DLC film forming chamber), and CM4 (AF film forming chamber); The CM3 process cavity can be modularized and switched into an optical coating cavity, and each cavity can flexibly switch process configurations, making it suitable for complex process research, development, design, and production.

◆ Vehicle hanging plate can be designed with special shapes, and special samples can be made

◆ Capable of producing optical films, color films, hard film layers, DLC, AF films on glass, ceramics, PC boards, and film substrates. Experimental applications include film system design and development, equipment software and hardware testing for coating processes such as mobile phone covers, cameras, smart homes, smart wearables, and car displays.

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