Dual and multi chamber magnetron sputtering coating equipment:
The dual chamber magnetron sputtering coating machine HD-CK1200-ICP is a highly compatible device suitable for making filters, facial recognition and other products such as film (NCVM), car mounted, camera superhard AR, IR-CUT, etc; Different film layers such as NB2O5, SIO2, SI3N4, SIH, Cr, In can be prepared, and the coating process room is not empty, with excellent stability and repeatability. The whole drum translation continuous method is adopted.
◆ Workpiece rotation: 1~120r/min infinitely adjustable
Extreme vacuum:<2.0E-4Pa
◆ Film uniformity: ≤ 1% (T Max. - Tmin.)/(T Max.+Tmin.)
Effective coating size:
Effective sputtering area of HD-CK1200-ICP Φ 1200mm * H400mm
